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CRUCIBLE MATERIALS CORPORATIONP
See Also: CRUCIBLE(S) casting cups, CRUCIBLE(S) or pot furnaces, laboratory CRUCIBLE(S)
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10. (2005/103657) A HIGH THROUGHPUT MULTI BEAM DETECTION SYSTEM AND METHOD.
Applicant: APPLIED MATERIALS ISRAEL LTD (IL) (AE AG AL AM AT AU AZ BA BB BE BF BG BJ BR BW BY BZ CA CF CG CH CI CM CN CO CR CU CY CZ DE DK DM DZ EC EE EG ES FI FR GA GB GD GE GH GM GN GQ GR GW HR HU ID IE IL IN IS IT JP KE KG KM KP KR KZ LC LK LR LS LT LU LV MA MC MD MG MK ML MN MR MW MX MZ NA NE NI NL NO NZ OM PG PH PL PT RO RU SC SD SE SG SI SK SL SM SN SY SZ TD TG TJ TM TN TR TT TZ UA UG UZ VC VN YU ZA ZM only)|APPLIED MATERIALS INC (US) (ZW only)|ELYASEF Emanuel (IL) (US Only)|ROGERS Steven R (IL) (US Only)
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Inventor: ELYASEF Emanuel(IL)|ROGERS Steven R(IL)
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Application Date: 2005-04-13
Publication Date: 2005-11-03
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11. (2005/091328) APPARATUS AND METHOD FOR DIRECTING GAS TOWARDS A SPECIMEN.
Applicant: APPLIED MATERIALS ISRAEL LTD (IL) (AE AG AL AM AT AU AZ BA BB BE BF BG BJ BR BW BY BZ CA CF CG CH CI CM CN CO CR CU CY CZ DE DK DM DZ EC EE EG ES FI FR GA GB GD GE GH GM GN GQ GR GW HR HU ID IE IL IN IS IT JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MC MD MG MK ML MN MR MW MX MZ NA NE NI NL NO NZ OM PG PH PL PT RO RU SC SD SE SG SI SK SL SM SN SY SZ TD TG TJ TM TN TR TT TZ UA UG UZ VC VN YU ZA ZM only)|APPLIED MATERIALS INC (US)|CAFRI Hagay (IL) (US Only)|PINHASI Eitan (IL) (US Only)
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Inventor: CAFRI Hagay(IL)|PINHASI Eitan(IL)
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Application Date: 2005-03-14
Publication Date: 2005-09-29
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12. (2005/074002) FOCUSING SYSTEM AND METHOD FOR A CHARGED PARTICLE IMAGING SYSTEM.
Applicant: APPLIED MATERIALS ISRAEL LTD (IL) (AE AG AL AM AT AU AZ BA BB BE BF BG BJ BR BW BY BZ CA CF CG CH CI CM CN CO CR CU CY CZ DE DK DM DZ EC EE EG ES FI FR GA GB GD GE GH GM GN GQ GR GW HR HU ID IE IL IN IS IT JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MC MD MG MK ML MN MR MW MX MZ NA NE NI NL NO NZ OM PG PH PL PT RO RU SC SD SE SG SI SK SL SN SY SZ TD TG TJ TM TN TR TT TZ UA UG UZ VC VN YU ZA ZM only)|APPLIED MATERIALS INC (US) (ZW only)|ROGERS Steve Robert (IL) (US Only)
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Inventor: ROGERS Steve Robert(IL)
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Application Date: 2005-01-20
Publication Date: 2005-08-11
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13. (2005/059531) ADVANCED ROUGHNESS METROLOGY.
Applicant: APPLIED MATERIALS ISRAEL LTD (IL) (AE AG AL AM AT AU AZ BA BB BE BG BR BW BY BZ CA CH CN CO CR CU CY CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY SZ TJ TM TN TR TT TZ UA UG UZ VC VN YU ZA ZM only)|APPLIED MATERIALS INC (US) (ZW only)|TAM Aviram (IL) (US Only)|CHASE Colin David (IL) (US Only)
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Inventor: TAM Aviram(IL)|CHASE Colin David(IL)
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Application Date: 2004-12-10
Publication Date: 2005-06-30
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14. (2005/026706) METHOD FOR HIGH EFFICIENCY MULTIPASS ARTICLE INSPECTION.
Applicant: APPLIED MATERIALS ISRAEL LTD (IL) (AE AG AL AM AT AU AZ BA BB BE BG BR BW BY BZ CA CH CN CO CR CU CY CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY SZ TJ TM TN TR TT TZ UA UG UZ VC VN YU ZA ZM only)|APPLIED MATERIALS INC (US) (ZW only)|ELYASEF Emanuel (IL) (US Only)|NAFTALI Ron (IL) (US Only)|YALOV Shimon (IL) (US Only)
(More From this Applicant...)
Inventor: ELYASEF Emanuel(IL)|NAFTALI Ron(IL)|YALOV Shimon(IL)
(More From this Inventor...)
Application Date: 2004-08-26
Publication Date: 2005-03-24
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16. (2005/036464) A MEASUREMENT SYSTEM AND A METHOD.
Applicant: APPLIED MATERIALS ISRAEL LTD (IL) (AE AG AL AM AT AU AZ BA BB BE BG BR BW BY BZ CA CH CN CO CR CU CY CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY SZ TJ TM TN TR TT TZ UA UG UZ VC VN YU ZA ZM only)|APPLIED MATERIALS INC (US) (ZW only)|TAM Aviram (IL) (US Only)
(More From this Applicant...)
Inventor: TAM Aviram(IL)
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Application Date: 2004-10-07
Publication Date: 2005-04-21
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17. (2005/073806) METHOD AND SYSTEM FOR CONTROLLING THE QUALITY OF A RETICLE.
Applicant: APPLIED MATERIALS ISRAEL LTD (IL) (AE AG AL AM AT AU AZ BA BB BE BF BG BJ BR BW BY BZ CA CF CG CH CI CM CN CO CR CU CY CZ DE DK DM DZ EC EE EG ES FI FR GA GB GD GE GH GM GN GQ GR GW HR HU ID IE IL IN IS IT JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MC MD MG MK ML MN MR MW MX MZ NA NE NI NL NO NZ OM PG PH PL PT RO RU SC SD SE SG SI SK SL SN SY SZ TD TG TJ TM TN TR TT TZ UA UG UZ VC VN YU ZA ZM only)|APPLIED MATERIALS INC (US) (ZW only)|BARTOV Avishay (IL) (US Only)
(More From this Applicant...)
Inventor: BARTOV Avishay(IL)
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Application Date: 2005-01-20
Publication Date: 2005-08-11
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18. (2005/031788) A SOURCE OF LIQUID METAL IONS AND A METHOD FOR CONTROLLING THE SOURCE.
Applicant: APPLIED MATERIALS ISRAEL LTD (IL) (AE AG AL AM AT AU AZ BA BB BE BG BR BW BY BZ CA CH CN CO CR CU CY CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY SZ TJ TM TN TR TT TZ UA UG UZ VC VN YU ZA ZM only)|APPLIED MATERIALS INC (US) (ZW only)|PEARL Asher (IL) (US Only)
(More From this Applicant...)
Inventor: PEARL Asher(IL)
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Application Date: 2004-09-17
Publication Date: 2005-04-07
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19. (2008/007190) WEAR RESISTANT HIGH TEMPERATURE ALLOY.
Applicant: EATON CORPORATION (US/US); Eaton Center, 1111 Superior Avenue, Cleveland, Ohio 44114-2584 (US) (All Except US). CRUCIBLE MATERIALS CORPORATION (US/US); 575 State Fair Boulevard, Syracuse, New York 13201 (US) (All Except US). SAWFORD, Maria, K. (US/US); 149 Valley Green Drive, Coraopolis, Pennsylvania 15108 (US) (US Only). SINHAROY, Shubhayu (US/US); 2400 Chestnut Street, Apt. 2806, Philadelphia, Pennsylvania 19103 (US) (US Only). NARASIMHAN, Sundaram (US/US); 616 Lyon Lake Road, Marshall, Michigan 49068 (US) (US Only). KAJINIC, Alojz (US/US); 310 Sixth Avenue, Carnegie, Pennsylvania 15106 (US) (US Only). WOJCIESZYNSKI, Andrzej, L. (US/US); 1197 Satellite Circle, Pittsburgh, Pennsylvania 15241 (US) (US Only). WRIGHT, Jeryl, K. (US/US); 229 Windcrest Drive, Camillus, New York 13031 (US) (US Only).
(More From this Applicant...)
Inventor: SAWFORD, Maria, K.; 149 Valley Green Drive, Coraopolis, Pennsylvania 15108 (US). SINHAROY, Shubhayu; 2400 Chestnut Street, Apt. 2806, Philadelphia, Pennsylvania 19103 (US). NARASIMHAN, Sundaram; 616 Lyon Lake Road, Marshall, Michigan 49068 (US). KAJINIC, Alojz; 310 Sixth Avenue, Carnegie, Pennsylvania 15106 (US). WOJCIESZYNSKI, Andrzej, L.; 1197 Satellite Circle, Pittsburgh, Pennsylvania 15241 (US). WRIGHT, Jeryl, K.; 229 Windcrest Drive, Camillus, New York 13031 (US).
(More From this Inventor...)
Application Date: 05.07.2007
Publication Date: 17.01.2008
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20. (2006/019446) DOUBLE INSPECTION OF RETICLE OR WAFER.
Applicant: APPLIED MATERIALS ISRAEL LTD (IL) (AE AG AL AM AT AU AZ BA BB BE BF BG BJ BR BW BY BZ CA CF CG CH CI CM CN CO CR CU CY CZ DE DK DM DZ EC EE EG ES FI FR GA GB GD GE GH GM GN GQ GR GW HR HU ID IE IL IN IS IT JP KE KG KM KP KR KZ LC LK LR LS LT LU LV MA MC MD MG MK ML MN MR MW MX MZ NA NE NI NL NO NZ OM PG PH PL PT RO RU SC SD SE SG SI SK SL SM SN SY SZ TD TG TJ TM TN TR TT TZ UA UG UZ VC VN YU ZA ZM only)|APPLIED MATERIALS INC (US) (ZW only)|NAFTALI Ron (IL) (US Only)|MADMON Yochanan (IL) (US Only)|SPEYER Gavriel (IL) (US Only)|BOIMAN Oren (IL) (US Only)
(More From this Applicant...)
Inventor: NAFTALI Ron(IL)|MADMON Yochanan(IL)|SPEYER Gavriel(IL)|BOIMAN Oren(IL)
(More From this Inventor...)
Application Date: 2005-05-04
Publication Date: 2006-02-23
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24. (2005/015500) MEASUREMENT OF CORNER ROUNDNESS.
Applicant: APPLIED MATERIALS ISRAEL LTD (IL) (AE AG AL AM AT AU AZ BA BB BE BG BR BW BY BZ CA CH CN CO CR CU CY CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY SZ TJ TM TN TR TT TZ UA UG UZ VC VN YU ZA ZM only)|APPLIED MATERIALS INC (US) (ZW only)|KRIS Roman (IL) (US Only)|GOTTLIB Gidi (IL) (US Only)|MENADEVA Ovadya (IL) (US Only)|GERSHTEIN Liraz (IL) (US Only)|TAM Aviram (IL) (US Only)
(More From this Applicant...)
Inventor: KRIS Roman(IL)|GOTTLIB Gidi(IL)|MENADEVA Ovadya(IL)|GERSHTEIN Liraz(IL)|TAM Aviram(IL)
(More From this Inventor...)
Application Date: 2004-08-06
Publication Date: 2005-02-17
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31. (2005/049882) HIGH PURITY HAFNIUM, TARGET AND THIN FILM COMPRISING SAID HIGH PURITY HAFNIUM, AND METHOD FOR PRODUCING HIGH PURITY HAFNIUM.
Applicant: NIKKO MATERIALS CO., LTD. (JP/JP); 10-1, Toranomon 2-chome, Minato-ku, Tokyo 105-0001 (JP) (All Except US). SHINDO, Yuichiro (JP/JP); c/o Isohara Factory of Nikko Materials Co., Ltd., 187-4, Usuba, Hanakawa-cho, Kitaibaraki-shi, Ibaraki 319-1535 (JP) (US Only).
(More From this Applicant...)
Inventor: SHINDO, Yuichiro (JP/JP); c/o Isohara Factory of Nikko Materials Co., Ltd., 187-4, Usuba, Hanakawa-cho, Kitaibaraki-shi, Ibaraki 319-1535 (JP).
(More From this Inventor...)
Application Date: 25.10.2004
Publication Date: 02.06.2005
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32. (2005/010220) HIGHLY PURE HAFNIUM MATERIAL, TARGET THIN FILM COMPRISING THE SAME AND METHOD FOR PRODUCING HIGHLY PURE HAFNIUM.
Applicant: NIKKO MATERIALS CO., LTD. (JP/JP); 10-1, Toranomon 2-chome, Minato-ku, Tokyo 105-0001 (JP) (All Except US). SHINDO, Yuichiro (JP/JP); c/o Isohara Factory of Nikko, Materials Co., Ltd., 187-4, Usuba, Hanakawa-cho, Kitaibaraki-shi, Ibaraki 319-1535 (JP) (US Only).
(More From this Applicant...)
Inventor: SHINDO, Yuichiro (JP/JP); c/o Isohara Factory of Nikko, Materials Co., Ltd., 187-4, Usuba, Hanakawa-cho, Kitaibaraki-shi, Ibaraki 319-1535 (JP).
(More From this Inventor...)
Application Date: 15.04.2004
Publication Date: 03.02.2005
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40. (2006/009514) VARIABLE FOCUS MICROLENS.
Applicant: AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG/SG); 20 Biopolis Way, #07-01, Centros, Singapore 138668 (SG) (All Except US). RODRÍGUEZ FERNÁNDEZ, Isabel (ES/SG); c/o Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602 (SG) (US Only). MORAN, Peter, M. (ZA/SG); c/o Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602 (SG) (US Only). KHAW, Aik Hau (MY/SG); c/o Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602 (SG) (US Only). DHARMATILLEKE, Saman (LK/SG); c/o Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602 (SG) (US Only).
(More From this Applicant...)
Inventor: RODRÍGUEZ FERNÁNDEZ, Isabel (ES/SG); c/o Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602 (SG). MORAN, Peter, M. (ZA/SG); c/o Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602 (SG). KHAW, Aik Hau (MY/SG); c/o Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602 (SG). DHARMATILLEKE, Saman (LK/SG); c/o Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602 (SG).
(More From this Inventor...)
Application Date: 20.07.2004
Publication Date: 26.01.2006
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41. (2005/033355) HIGH PURITY ZINC OXIDE POWDER AND METHOD FOR PRODUCTION THEREOF, AND HIGH PURITY ZINC OXIDE TARGET AND THIN FILM OF HIGH PURITY ZINC OXIDE.
Applicant: NIKKO MATERIALS CO., LTD. (JP/JP); 10-1, Toranomon 2-chome, Minato-ku, Tokyo, 1050001 (JP) (All Except US). SHINDO, Yuichiro (JP/JP); c/o Isohara Factory of Nikko Materials Co., Ltd. 187-4, Usuba, Hanakawa-cho, Kitaibaraki-shi, Ibaraki, 3191535 (JP) (US Only). TAKEMOTO, Kouichi (JP/JP); c/o Isohara Factory of Nikko Materials Co., Ltd. 187-4, Usuba, Hanakawa-cho, Kitaibaraki-shi, Ibaraki, 3191535 (JP) (US Only).
(More From this Applicant...)
Inventor: SHINDO, Yuichiro (JP/JP); c/o Isohara Factory of Nikko Materials Co., Ltd. 187-4, Usuba, Hanakawa-cho, Kitaibaraki-shi, Ibaraki, 3191535 (JP). TAKEMOTO, Kouichi (JP/JP); c/o Isohara Factory of Nikko Materials Co., Ltd. 187-4, Usuba, Hanakawa-cho, Kitaibaraki-shi, Ibaraki, 3191535 (JP).
(More From this Inventor...)
Application Date: 08.09.2004
Publication Date: 14.04.2005
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42. (2007/142261) POWER ELEMENT MOUNTING SUBSTRATE, METHOD FOR MANUFACTURING THE POWER ELEMENT MOUNTING SUBSTRATE, POWER ELEMENT MOUNTING UNIT, METHOD FOR MANUFACTURING THE POWER ELEMENT MOUNTING UNIT, AND POWER MODULE.
Applicant: MITSUBISHI MATERIALS CORPORATION (JP/JP); 5-1, Otemachi 1-chome, Chiyoda-ku, Tokyo, 1008117 (JP) (All Except US). KUROMITSU, Yoshirou (JP/JP); c/o MITSUBISHI MATERIALS CORPORATION, Central Research Institute, 1002-14, Mukaiyama, Naka-shi, Ibaraki, 3110102 (JP) (US Only). ISHIZUKA, Hiroya (JP/JP); c/o MITSUBISHI MATERIALS CORPORATION, Central Research Institute, 1002-14, Mukaiyama, Naka-shi, Ibaraki, 3110102 (JP) (US Only). MIYATA, Hiroshi (JP/JP); c/o MITSUBISHI MATERIALS CORPORATION, Central Research Institute, 1002-14, Mukaiyama, Naka-shi, Ibaraki, 3110102 (JP) (US Only). KITAHARA, Takeshi (JP/JP); c/o MITSUBISHI MATERIALS CORPORATION, Central Research Institute, 1002-14, Mukaiyama, Naka-shi, Ibaraki, 3110102 (JP) (US Only). TONOMURA, Hiroshi (JP/JP); c/o MITSUBISHI MATERIALS CORPORATION, Central Research Institute, 1002-14, Mukaiyama, Naka-shi, Ibaraki, 3110102 (JP) (US Only).
(More From this Applicant...)
Inventor: KUROMITSU, Yoshirou (JP/JP); c/o MITSUBISHI MATERIALS CORPORATION, Central Research Institute, 1002-14, Mukaiyama, Naka-shi, Ibaraki, 3110102 (JP). ISHIZUKA, Hiroya (JP/JP); c/o MITSUBISHI MATERIALS CORPORATION, Central Research Institute, 1002-14, Mukaiyama, Naka-shi, Ibaraki, 3110102 (JP). MIYATA, Hiroshi (JP/JP); c/o MITSUBISHI MATERIALS CORPORATION, Central Research Institute, 1002-14, Mukaiyama, Naka-shi, Ibaraki, 3110102 (JP). KITAHARA, Takeshi (JP/JP); c/o MITSUBISHI MATERIALS CORPORATION, Central Research Institute, 1002-14, Mukaiyama, Naka-shi, Ibaraki, 3110102 (JP). TONOMURA, Hiroshi (JP/JP); c/o MITSUBISHI MATERIALS CORPORATION, Central Research Institute, 1002-14, Mukaiyama, Naka-shi, Ibaraki, 3110102 (JP).
(More From this Inventor...)
Application Date: 06.06.2007
Publication Date: 13.12.2007
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43. (2002/029125) HIGH PURITY ZIRCONIUM OR HAFNIUM, SPUTTERING TARGET COMPRISING THE HIGH PURITY ZIRCONIUM OR HAFNIUM AND THIN FILM FORMED USING THE TARGET, AND METHOD FOR PRODUCING HIGH PURITY ZIRCONIUM OR HAFNIUM AND METHOD FOR PRODUCING POWDER OF HIGH PURITY ZIRCONIUM OR HAFNIUM.
Applicant: NIKKO MATERIALS COMPANY, LIMITED (JP/JP); 10-1, Toranomon 2-chome
Minato-ku
Tokyo 105-8407 (JP) (All Except US). SHINDO, Yuichiro (JP/JP); c/o Isohara Factory of Nikko Materials Company, Limited
187-4, Usuba
Hanakawa-cho, Kitaibaraki-shi
Ibaraki 319-1535 (JP) (US Only).
(More From this Applicant...)
Inventor: SHINDO, Yuichiro (JP/JP); c/o Isohara Factory of Nikko Materials Company, Limited
187-4, Usuba
Hanakawa-cho, Kitaibaraki-shi
Ibaraki 319-1535 (JP).
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Application Date: 29.06.2001
Publication Date: 11.04.2002
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44. (1068278) 含具有氨基磺酰基的活性化合物(COX-2抑制劑)、聚乙二醇和清除游離基的抗氧化物的口服傳遞的藥用組合物ORALLY DELIVERABLE PHARMACEUTICAL COMPOSITION COMPRISING AN ACTIVE COMPOUND HAVING AN AMINOSULFONYL GROUP (COX-2-INHIBITOR), A POLYETHYLENE GLYCOL AND A FREE-RADICAL SCAVENGING ANTIOXIDANT.
Applicant: 法馬西亞公司美國/美利堅合眾國PHARMACIA CORPORATIONP.O. Box 1027 ChesterfieldMO 63006UNITED STATES/UNITED STATES OF AMERICA
(More From this Applicant...)
Inventor: GAO, PINGHUANG, TIEHUAROBINS, RUSSELL, H.BAUER, JULIANE, M.GUIDO, JANE, E.BRUGGER, ANDREW, M.KARIM, AZIZHASSAN, FREDFORBES, JAMES, C.
(More From this Inventor...)
Application Date: 21.01.2005
Publication Date: 29.04.2005/A
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45. (2006/077855) POLYMER, CROSSLINKED POLYMER, COMPOSITION FOR SOLID POLYMER ELECTROLYTE, SOLID POLYMER ELECTROLYTE AND ADHESIVE COMPOSITION.
Applicant: NIPPON SODA CO., LTD. (JP/JP); 2-1, Ohtemachi 2-chome, Chiyoda-ku, Tokyo 100-8165 (JP) (All Except US). NIITANI, Takeshi (JP/JP); c/o Nippon Soda Co., Ltd., R & D Laboratory for High-Performance Materials, 12-54, Goiminamikaigan, Ichihara-shi, Chiba 290-0045 (JP) (US Only). AMAIKE, Masato (JP/JP); c/o Nippon Soda Co., Ltd., R & D Laboratory for High-Performance Materials, 12-54, Goiminamikaigan, Ichihara-shi, Chiba 290-0045 (JP) (US Only). SHIMADA, Mikiya (JP/JP); c/o Nippon Soda Co., Ltd., R & D Laboratory for High-Performance Materials, 12-54, Goiminamikaigan, Ichihara-shi, Chiba 290-0045 (JP) (US Only). KAWAMURA, Kiyoshi (JP/JP); c/o Nippon Soda Co., Ltd., R & D Laboratory for High-Performance Materials, 12-54, Goiminamikaigan, Ichihara-shi, Chiba 290-0045 (JP) (US Only).
(More From this Applicant...)
Inventor: NIITANI, Takeshi (JP/JP); c/o Nippon Soda Co., Ltd., R & D Laboratory for High-Performance Materials, 12-54, Goiminamikaigan, Ichihara-shi, Chiba 290-0045 (JP). AMAIKE, Masato (JP/JP); c/o Nippon Soda Co., Ltd., R & D Laboratory for High-Performance Materials, 12-54, Goiminamikaigan, Ichihara-shi, Chiba 290-0045 (JP). SHIMADA, Mikiya (JP/JP); c/o Nippon Soda Co., Ltd., R & D Laboratory for High-Performance Materials, 12-54, Goiminamikaigan, Ichihara-shi, Chiba 290-0045 (JP). KAWAMURA, Kiyoshi (JP/JP); c/o Nippon Soda Co., Ltd., R & D Laboratory for High-Performance Materials, 12-54, Goiminamikaigan, Ichihara-shi, Chiba 290-0045 (JP).
(More From this Inventor...)
Application Date: 18.01.2006
Publication Date: 27.07.2006
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47. (2007/139086) SUBSTRATE FOR GROWTH OF CARBON NANOTUBE, METHOD FOR GROWTH OF CARBON NANOTUBE, METHOD FOR CONTROL OF PATICLE DIAMETER OF CATALYST FOR GROWTH OF CARBON NANOTUBE, AND METHOD FOR CONTROL CARBON NANOTUBE DIAMETER.
Applicant: ULVAC, INC. (JP/JP); 2500, Hagisono, Chigasaki-shi, Kanagawa, 2538543 (JP) (All Except US). NAKANO, Haruhisa (JP/JP); c/o ULVAC, Inc., Tsukuba Institute for Super Materials, 5-9-6 Tokodai, Tsukuba-shi, Ibaraki, 3002635 (JP) (US Only). YAMAZAKI, Takahisa (JP/JP); c/o ULVAC, Inc., Tsukuba Institute for Super Materials, 5-9-6 Tokodai, Tsukuba-shi, Ibaraki, 3002635 (JP) (US Only). MURAKAMI, Hirohiko (JP/JP); c/o ULVAC, Inc., Tsukuba Institute for Super Materials, 5-9-6 Tokodai, Tsukuba-shi, Ibaraki, 3002635 (JP) (US Only).
(More From this Applicant...)
Inventor: NAKANO, Haruhisa (JP/JP); c/o ULVAC, Inc., Tsukuba Institute for Super Materials, 5-9-6 Tokodai, Tsukuba-shi, Ibaraki, 3002635 (JP). YAMAZAKI, Takahisa (JP/JP); c/o ULVAC, Inc., Tsukuba Institute for Super Materials, 5-9-6 Tokodai, Tsukuba-shi, Ibaraki, 3002635 (JP). MURAKAMI, Hirohiko (JP/JP); c/o ULVAC, Inc., Tsukuba Institute for Super Materials, 5-9-6 Tokodai, Tsukuba-shi, Ibaraki, 3002635 (JP).
(More From this Inventor...)
Application Date: 29.05.2007
Publication Date: 06.12.2007
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49. (2007/004569) PHOTOSENSITIVE ADHESIVE COMPOSITION, AND OBTAINED USING THE SAME, ADHESIVE FILM, ADHESIVE SHEET, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, SEMICONDUCTOR DEVICE AND ELECTRONIC PART.
Applicant: HITACHI CHEMICAL COMPANY, LTD. (JP/JP); 1-1, Nishi-Shinjuku 2-chome, Shinjuku-ku, Tokyo, 1630449 (JP) (All Except US). KAWAMORI, Takashi (JP/JP); c/o Electronic Materials R & D Center, HITACHI CHEMICAL COMPANY, LTD., 48, Wadai, Tsukuba-shi, Ibaraki, 3004247 (JP) (US Only). MASUKO, Takashi (JP/JP); c/o Electronic Materials R & D Center, HITACHI CHEMICAL COMPANY, LTD., 48, Wadai, Tsukuba-shi, Ibaraki, 3004247 (JP) (US Only). KATOGI, Shigeki (JP/JP); c/o Electronic Materials R & D Center, HITACHI CHEMICAL COMPANY, LTD., 48, Wadai, Tsukuba-shi, Ibaraki, 3004247 (JP) (US Only). YASUDA, Masaaki (JP/JP); c/o Electronic Materials R & D Center, HITACHI CHEMICAL COMPANY, LTD., 48, Wadai, Tsukuba-shi, Ibaraki, 3004247 (JP) (US Only).
(More From this Applicant...)
Inventor: KAWAMORI, Takashi (JP/JP); c/o Electronic Materials R & D Center, HITACHI CHEMICAL COMPANY, LTD., 48, Wadai, Tsukuba-shi, Ibaraki, 3004247 (JP). MASUKO, Takashi (JP/JP); c/o Electronic Materials R & D Center, HITACHI CHEMICAL COMPANY, LTD., 48, Wadai, Tsukuba-shi, Ibaraki, 3004247 (JP). KATOGI, Shigeki (JP/JP); c/o Electronic Materials R & D Center, HITACHI CHEMICAL COMPANY, LTD., 48, Wadai, Tsukuba-shi, Ibaraki, 3004247 (JP). YASUDA, Masaaki (JP/JP); c/o Electronic Materials R & D Center, HITACHI CHEMICAL COMPANY, LTD., 48, Wadai, Tsukuba-shi, Ibaraki, 3004247 (JP).
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Application Date: 30.06.2006
Publication Date: 11.01.2007
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91. (1020070011250) RETAINING RING WITH SHAPED SURFACE.
Applicant: APPLIED MATERIALS INC
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Inventor: CHEN HUNG CHIH|ZUNIGA STEVEN M|GARRETSON CHARLES C|MCALLISTER DOUGLAS R|MEYER STACY|LIN JIAN|HUEY SIDNEY P|OH JEONG HOON|DON TRUNG T|SCHMIDT JEFFREY|WOHLERT MARTIN S|HUGHES KERRY F|WANG JAMES C|LU DANIEL CAM|DELAMENIE ROMAIN BEAU|BALAGANI VENKATA R|ALLEN ADEN MARTIN|FONG MICHAEL JON
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Application Date: _20060613
Publication Date: _20070124
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