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TRAPPING / 捕获
See Also: IPC A01B, IPC A01C, IPC A01D, IPC A01F, IPC A01G
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1. (2006/049489) A LITHOGRAPHIC APPARATUS HAVING A CONTAMINANT TRAPPING SYSTEM, A CONTAMINANT TRAPPING SYSTEM, A DEVICE MANUFACTURING METHOD, AND A METHOD FOR TRAPPING OF CONTAMINANTS IN A LITHOGRAPHIC APPARATUS.
Applicant: ASML NETHERLANDS B.V. (NL/NL); De Run 6501, NL-5504 DR Veldhoven (NL) (All Except US). BAKKER, Levinus, Pieter (NL/NL); Broederwal 31, NL-5708 ZT Helmond (NL) (US Only). BANINE, Vadim, Yevgenyevich (NL/NL); Nierslaan 2, NL-5704 NK Helmond (NL) (US Only). WASSINK, Arnoud, Cornelis (NL/NL); De Plank 12, NL-5504 TB Veldhoven (NL) (US Only).
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Inventor: BAKKER, Levinus, Pieter; Broederwal 31, NL-5708 ZT Helmond (NL). BANINE, Vadim, Yevgenyevich; Nierslaan 2, NL-5704 NK Helmond (NL). WASSINK, Arnoud, Cornelis; De Plank 12, NL-5504 TB Veldhoven (NL).
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Application Date: 19.09.2005
Publication Date: 11.05.2006
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6. (1999/007000) TWO BIT EEPROM USING ASYMMETRICAL CHARGE TRAPPING.
Applicant: SAIFUN SEMICONDUCTORS LTD. (IL/IL); Bet HaSofer
Hamelacha Street 65
42504 Industrial Area South Netanya (IL) (AL, AM, AT, AU, AZ, BA, BB, BE, BF, BG, BJ, BR, BY, CA, CF, CG, CH, CI, CM, CN, CU, CY, CZ, DE, DK, EE, ES, FI, FR, GA, GB, GE, GH, GM, GN, GR, GW, HR, HU, ID, IE, IL, IS, IT, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MC, MD, MG, MK, ML, MN, MR, MW, MX, NE, NL, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, SN, SZ, TD, TG, TJ, TM, TR, TT, UA, UG, UZ, VN, YU, ZW only). EITAN, Boaz (IL/IL); Achi Dakar Street 4
43259 Ra'anana (IL) (US Only).
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Inventor: EITAN, Boaz; Achi Dakar Street 4
43259 Ra'anana (IL).
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Application Date: 02.08.1998
Publication Date: 11.02.1999
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23. (7411181) System and method for manipulating and processing materials using
holographic optical trapping.
Assignee: Arryx, Inc.
(Chicago,
IL)
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Inventor: Plewa; Joseph (Park Ridge, IL), Tanner; Evan (Chicago, IL), Mueth; Dan (Chicago, IL), Gruber; Lewis (Chicago, IL), Bradley; Kenneth (Hinsdale, IL)
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Application Date: October 28, 2004
Publication Date: August 12, 2008
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32. (7351592) Microfluidic device and method with trapping of sample in cavities having
lids that can be opened or closed.
Inventor: Storek; David (S-412 62 Goteborg, SE), Schneeberger; Niklaus (CH-2017 Boudry, CH), Otillar, Jr.; Robert P. (Los Altos, CA), Krozer; Anatol (S-413 Goteborg, SE)
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Application Date: February 24, 2003
Publication Date: April 1, 2008
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33. (7312611) Apparatus and method for trapping bead based reagents within microfluidic
analysis systems.
Assignee: The Governors of the University of Alberta
(Alberta,
CA)
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Inventor: Harrison; D. Jed (Edmonton, CA), Oleschuk; Richard (Kingston, CA), Shultz-Lockyear; Loranelle (Durango, CO), Skinner; Cameron (Montreal, CA), Li; Paul (Burnaby, CA)
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Application Date: November 27, 2000
Publication Date: December 25, 2007
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41. (200508365-4) LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM AND DEBRIS TRAPPING SYSTEM.
Applicant: ASML NETHERLANDS B.V. (NL)
DE RUN 6501,
NL-5504 DR VELDHOVEN,
THE NETHERLANDS
NETHERLANDS
(More From this Applicant...)
Inventor: BAKKER, LEVINUS PIETER
BROEDERWAL 31,
NL-5708 ZT HELMOND,
THE NETHERLANDS
NETHERLANDS
KLUNDER, DERK JAN WILFRED
VAN ERPSTRAAT 50,
NL-5666 RS GELDROP,
THE NETHERLANDS
NETHERLANDS
VAN HERPEN, MAARTEN MARINUS JOHANNES WILHELMUS
DE SIKKEL 32,
NL-5384 HS HEESCH,
THE NETHERLANDS
NETHERLANDS
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Application Date: 23/Dec/2005
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51. (2004/058687) METHOD OF PURIFYING/CONCENTRATING SUGAR CHAIN WITH SUGAR CHAIN-TRAPPING MOLECULE AND METHOD OF ANALYZING SUGAR CHAIN STRUCTURE.
Applicant: SHIONOGI CO., LTD. (JP/JP); 1-8, Doshomachi 3-chome, Chuo-ku, Osaka-shi, Osaka 541-0045 (JP) (All Except US). NISHIMURA, Shinichiro (JP/JP); 1-1-302, Kitakujonishi 16-chome, Chuo-ku, Sapporo-shi, Hokkaido 060-0009 (JP) (US Only). NIIKURA, Kenichi (JP/JP); 2-1-501, Minamirokujonishi 20-chome, Chuo-ku, Sapporo-shi, Hokkaido 064-0806 (JP) (US Only). NAKAGAWA, Hiroaki (JP/JP); 12-601, Kitagojonishi 9-chome, Chuo-ku, Sapporo-shi, Hokkaido 060-0005 (JP) (US Only). OKAYAMA, Minenobu (JP/JP); 309 Raburihaitsutogashira, 1634-2, Togashira, Toride-shi, Ibaraki 302-0034 (JP) (US Only).
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Inventor: NISHIMURA, Shinichiro (JP/JP); 1-1-302, Kitakujonishi 16-chome, Chuo-ku, Sapporo-shi, Hokkaido 060-0009 (JP). NIIKURA, Kenichi (JP/JP); 2-1-501, Minamirokujonishi 20-chome, Chuo-ku, Sapporo-shi, Hokkaido 064-0806 (JP). NAKAGAWA, Hiroaki (JP/JP); 12-601, Kitagojonishi 9-chome, Chuo-ku, Sapporo-shi, Hokkaido 060-0005 (JP). OKAYAMA, Minenobu (JP/JP); 309 Raburihaitsutogashira, 1634-2, Togashira, Toride-shi, Ibaraki 302-0034 (JP).
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Application Date: 25.12.2003
Publication Date: 15.07.2004
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